Название: VLS grating for X-Ray optics as fabricated by e-beam nanolithography with optically confirmed exponential line-density variation
Аннотация: We report the development of a large-area plane Varied Line-Space grating with line density varying exponentially along the grating surface roughly from 160 to 560 mm-1. The grating was produced using e-beam lithography with original square-stamp beam profile and is intended for an innovative high-resolution single-component grazing-incidence monochromator, in which wavelength scanning is achieved simply by linear movement of the grating along its surface. For a grating width of 60 mm, the first-order operating spectral range is 9-20 nm. Optical measurements of the line density-vs-coordinate dependence reveal perfect match between the fabricated and intended by the design density dependences.
Авторы: A. I. Arzhanov, V. V. Shulga, A. S. Shelkovnikov, K. E. Aleksashin, A. Yu. Neliubov, A. O. Kolesnikov, M. D. Logachev, A. N. Shatokhin, E. A. Vishnyakov, E. N. Ragozin, A. V. Naumov
